| Solver: Kolařík Vladimír I GA ČR GA102/05/2325, date: 01:01:2005 - 31:12:2006. Actual electron-beam lithographic system BS 600 works with the limit resolution of 0.1 microns. Recently, we have received a couple of requirements for production of structures with better resolution. The aim of this project is to study a preparation of structures with the resolution below 100 nanometers. The solution has to address both the system part of the lithograph and the technological issues concerning such a high resolution. As a result, nanostructures with extremely high resolution will be prepared. |
